Use of RunShare

The purpose of Runshare is to facilitate the sharing of process runs in order to save resources.
It has been customary that lab users allow others to join in a batch run when practical, since it causes little impact to the user. Remember that this is a two-way street: If you're going to ask others to help you, then please return the favor and let others join your runs.

Protocol:

1. There are two types of entries you can make:
   • post a run that you are already planning to do, and willing to let others join,
   • or post a request to see if others might be able to accomodate your wafers.
   Select this first with the radio buttons at the top of the page.
2. Select a date for your run. This is the date that the posting will expire, so if you are requesting a run, and you need it by the end of the week, select a date that is at the end of the week. You can note in the comments that your wafers might be ready sooner than the posted date. If you have a reservation already, and are posting a run that you are willing to share, post the date the run will occur. (Note that the date is used to delete expired reservations, so choose the date accordingly)
3. Select the Type of Process: Several types of processes are listed in the list. You can choose "other" and describe in the comments if your type of run is not listed. Or choose "Any Suitable" if, for instance, you need a metal, sputtered or evaporated.
4. Enter the name of the program or process, or the material in the Program Name or Material section. This is where protocol is important.
   • If you are describing a furnace run, listing the program name, for instance "WET950" is the best practice. If it's a deposition with multiple variables, for instance PSG400, then it should be listed as: "PSG400 4%" (indicating that you will use the PSG400 recipe with 4% phosphorus). For an anneal, you should give the time with the program, such as "1050AN 00:30:00"
   • Ti/Pt/Au (this would be a stack of Titanium deposited first on the substrate, then platinum, then gold on top.)
   • If it's an alloy, for instance, Aluminum-Silicon, use a hyphen to describe the alloy: Al-1%Si (this would describe an alloy of Aluminum having 1% silicon.)
   • For an ion-implant, you should list the species, dose and energy, eg: "As 5e15 150keV". You may also want to list the tilt/rotation/beam current in the comments section, if it's important.
5. Enter the Film Thickness of the deposition. If there are multiple layers, as in the Ti/Pt/Au example above, use the same format, eg: "200/500/1200" would indicate that the first Ti layer is 200A, the Pt layer is 500A, and the gold is 1200A. If you are posting a request, or even posting a run, you can indicate a range if desired. For instance, if in the above example, you don't care much about the thickness of the top gold layer, you could write: "200/500/800-2000"
6. Enter the number of wafers.
   • If you are posting a run willing to share, this is the number of open slots in your run.
   • If you are posting a request, this is the number of wafers you need (or would like) to have included.
7. Enter your email. You can enter whatever email you'd like. The suggested format is to use only your SNF email (IE: coral login) as the email address, and leave off the stanford.edu part, for instance: user@snf. Another spam-resistant method is to post as: user-at-hotmail-dot-com. Currently, the database is password protected to the outside world, so the spam risk should be minimal.
8. Enter Comments. Any other information that may be useful. Some suggestions:
   • Specific variables not included in the form. eg: Base pressure required, and Loadlock sputter etch.
   • Flexibility in your process. If you really don't care about the thickness, for instance, you can indicate that here.
   • Vendor or tool information. You might be running in a 6" furnace, or running this at Lance Goddard, or Process Specialties.
   • You may want to put your phone number here, so someone can contact you at the last minute.
   • If posting a "WANTED" run. You might want to give the location of the wafers, so that another user can grab your wafers at the last minute and include them in their run. For instance "Wafers are in bin G45, labeled 'Runshare Poly'. Please include them in your run if you can". You should include all instructions on the box, and also include instructions to mark the box as "Poly run completed" if completed. (So the wafers do not get inadvertently processed twice!!)

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